SUSS Microtec’s LabSpin platform represents the latest generation of manual coater/developer systems developed specifically for laboratory and R&D. Designed for a variety of photolithographical chemicals, the LabSpin process station provides uniform, precise and repeatable coating thanks to its advanced process chamber design.

What is a spin coating 

Spin coating involves depositing a liquid solution onto a spinning substrate in order to produce a thin film of a solid material, such as a polymer, nano-dispersions, sol-gels etch.  As the substrate revolves according to a set of final speed, time and acceleration instructions, the centrifugal motion spreads the solution across the substrate. The set of instructions are formulated during the calibration stage that takes into account the properties of the coating liquid and the required thickens of the coated thin film. As the speed increases more of the solution is expelled from the substrate reaching an equilibrium of thickness when drag forces are balanced by rotational acceleration forces.

Features of the in-house LabSpin8:

  • Speed: 50 – 99 rpm, 100 – 8,000 rpm (+/- 1 rpm) with 200 mm chuck
  • Acceleration: 4,000 rpm/sec
  • Spinning time: 1 s up to 999 s
  • 200 recipes with 40 steps each
  • Waste bottle 0.5 lt
  • Vacuum chuck for up to 200 mm wafer or mask (round or square)
  • Centre and edge coating
  • Edge bead removal
  • Developer dispense option
  • Nitrogen drying

SUSS LabSpin8 permitted media

  • For the coater

    • PGMEA,
    • PGME,
    • cyclopentanone,
    • 4-butyrolactone,
    • 1-methyl-2-pyrrolidone,
    • isopropyl alcohol,
    • acetone
    • B2O3 (Ethanol solution)
    • P2O5 (Ethanol solution)
  • For the developer

    • max: 5 % Na2CO3,
    • KOH 5 %,
    • NaOH 5 %,
    • TMAH 5 %,
    • 95 % DI water.