Nanofabrication and Microfluidics
MTIF´s clean rooms house the latest in micro and nano-fabrication processes and equipment. The facility works on silica, glass, metal and polymer substrates using a range of deposition techniques including spin coaters, magnetron sputtering and Atomic Layer Deposition followed by annealing, curing, and sintering as required. A wide range of patterning processes are available including mask-less photolithography, laser ablation and laser processing.
Thin Films Laboratory
A variety of assistive technologies for materials deposition, including physical and chemical deposition techniques, such as RF magnetron sputtering, atomic layer deposition and thermal evaporation of nano-engineered coatings and thin films. These are applicable across a broad range of industrial applications such as, optical coatings, plasmonic thin films, SERS sensors and large-area electronic devices.
Laser Processing Laboratory
Specialised laser processing facility for developing new materials or functionalising existing materials, in controlled environments. Capable of investigating all the parameters of this multiparametric processing technique in the design, implementation and testing of materials for nano-structuring, texturing and functionalisation.
Part of the specialised material and surface modification capability utilising photonic processing in controlled environments. The interaction of light with materials is exploited using a suite of state-of-the-art optical metrology techniques including a unique IR Spectroscopic Ellipsometer that accurately measures the dielectric permittivity of materials in the spectral range of 1.7 – 40 microns. Of particularly interest is the control and enhancement of the light-matter interaction with suitably engineered nanostructures, such as optical antennas or resonators. The manipulation of optical fields at the nanometer scale is important for enhancing the performance and efficiency of photodetectors, light emitting devices and optical sensors.
Part of the specialised material and surface modification capability using photonic processing in controlled environments. The interaction of light with materials is exploited using a suite of state-of-the-art optical metrology techniques, including a unique IR Spectroscopic Ellipsometer that accurately measures the dielectric permittivity of materials in the spectral range of 1.7 – 40 microns.
|YES HDMS oven||YES HDMS oven|
|Veeco WYKO 1100 white light interferometric profilelometer|
|Tresky T-3002-PRO die bonder||Tresky T-3002-PRO die bonding|
|SUSS LabSpin8TT||SUSS LS8TT FR|
|Slot Die coater|
|PS4L semiprobe connected to Keithley 4200A Parameter analyser||Semiprobe PS4L|
|NIR laminator with Adphos NIR lamp|
|Multi-target RF magnetron systems|
|Microwriter maskless aligner||Microwriter Maskless Aligner|
|MakerBot 3d printer|
|HAAKE CaBER1 extensional rheometer||HAAKE CaBER 1 Extensional rheometer|
|Formlabs SLA 3D printers|
|Fisnar F9000N XYZ robot furnished with eco spray/pen and LIQUIDYN heads||Fisnar 9600N XYZ Robot|
|Filmetrics f20 reflectometer|
|Diener Tetra 45 plasma etcher||Diener Reactive Plasma Etcher Tetra 45|
|DektakXT stylus profilometer|
|AVT PEO-604 oxidation oven|
|AKTIPRINT Mini/e SMALL UV DRYER|
|3 TruMark Series 3000 Trumpf|
|3 excimer lasers|
|1 Trotec SP500 CO2 laser cutter|
|1 Quantel Q-Smart 850 laser|
|1 He-Cd Omnicrome|
|Bruker NIR ellipsometer|