Conventional approaches to photolithography are usually based on exposing through a chromium-glass mask manufactured by specialist vendors. In R&D environments it is often necessary to change the mask design frequently.
Direct-write lithography tools (also known as digital mask aligners or maskless aligners) overcome this problem by holding the mask in software. Rather than projecting light through a physical mask, direct-write lithography uses computer-controlled optics to project the exposure pattern directly onto the photoresist.
Applications that require to the MicroWriter ML®3
- Microelectronics and semiconductors
- MEMS / NEMS
- Microfluidics and lab-on-a-chip
- Materials science
- Graphene and other 2-dimensional materials
Industry segments requiring the MicroWriter ML®3
- University Research
- Development & Characterisation
- Production Test
- Semiconductor industry
- Solar Cell