Conventional approaches to photolithography are usually based on exposing through a chromium-glass mask manufactured by specialist vendors. In R&D environments it is often necessary to change the mask design frequently.

Direct-write lithography tools (also known as digital mask aligners or maskless aligners) overcome this problem by holding the mask in software. Rather than projecting light through a physical mask, direct-write lithography uses computer-controlled optics to project the exposure pattern directly onto the photoresist.

Applications that require to the MicroWriter ML®3

  • Microelectronics and semiconductors
  • Spintronics
  • Sensors
  • Microfluidics and lab-on-a-chip
  • Nanotechnology
  • Materials science
  •  Graphene and other 2-dimensional materials

Industry segments requiring the MicroWriter ML®3

  • University Research
  • Development & Characterisation
  • Production Test
  • Semiconductor industry
  • Medical
  • Photonics
  • Solar Cell
  • Nanoelectronics
  • Microelectronics